Design and realization of a photolithography alignment and uv exposure equipement for pedagogical and laboratory experiment purposesRonaldo Domingues Mansano, Nilson Ordonez, Nilton Morimoto, Patrick Verdonck, Bertrand Carbonne, Yves Danto et Olivier BonnaudJ3eA, 7 (2008) 1033DOI: https://doi.org/10.1051/j3ea:2008032
