J3eA, Journal sur l'enseignement des sciences et technologies de l'information et des systèmes

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Design and realization of a photolithography alignment and uv exposure equipement for pedagogical and laboratory experiment purposes

Ronaldo Domingues Mansano, Nilson Ordonez, Nilton Morimoto, Patrick Verdonck, Bertrand Carbonne, Yves Danto and Olivier Bonnaud

J3eA, 7 (2008) 1033

Published online: 22 février 2008

DOI: 10.1051/j3ea:2008032

Ronaldo Domingues Mansano

Nilson Ordonez

Nilton Morimoto

Patrick Verdonck

Bertrand Carbonne

Yves Danto

Olivier Bonnaud

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